Date of Award

Spring 1-1-2015

Document Type


Degree Name

Master of Science (MS)


Mechanical Engineering

First Advisor

John Pellegrino

Second Advisor

Peter E. Hamlington

Third Advisor

Thomas Hauser


Nano Imprint Lithography (NIL) endows Ultra Filtration (UF) membranes with a plethora of filtration benefits. This research is to study for purposes of optimization the fundamental physics behind the fouling mitigation properties derived from the NIL patterns on UF membranes. Factors from experimental studies that are examined are : pattern height, permeation rate, cross flow velocity, and angle of attack. Factors from literature that affect these criteria are shear rate, gradient of shear rate and the non-linearity parameter, which is a ratio of the shear rate and it’s gradient. My work consists of computational fluid dynamic (CFD) simulations to understand the underlying physics. Additionally, milk filtration experiments are done to test pattern effectiveness with complex fluids. Results indicate that the shear gradient best represents fluid effects while membrane recovery is effected by the patterning.