Graduate Thesis Or Dissertation

 

Simulations and Experiments for Fouling Mitigation on Patterned Nano-Imprint Lithography Ultra Filtration Membranes Public Deposited

Downloadable Content

Download PDF
https://scholar.colorado.edu/concern/graduate_thesis_or_dissertations/js956g25j
Abstract
  • Nano Imprint Lithography (NIL) endows Ultra Filtration (UF) membranes with a plethora of filtration benefits. This research is to study for purposes of optimization the fundamental physics behind the fouling mitigation properties derived from the NIL patterns on UF membranes. Factors from experimental studies that are examined are : pattern height, permeation rate, cross flow velocity, and angle of attack. Factors from literature that affect these criteria are shear rate, gradient of shear rate and the non-linearity parameter, which is a ratio of the shear rate and it’s gradient. My work consists of computational fluid dynamic (CFD) simulations to understand the underlying physics. Additionally, milk filtration experiments are done to test pattern effectiveness with complex fluids. Results indicate that the shear gradient best represents fluid effects while membrane recovery is effected by the patterning.
Creator
Date Issued
  • 2015
Academic Affiliation
Advisor
Committee Member
Degree Grantor
Commencement Year
Subject
Last Modified
  • 2019-11-18
Resource Type
Rights Statement
Language

Relationships

Items